METHOD FOR CLEANING MAGNETIC FILM PROCESSING CHAMBER, METHOD FOR MANUFACTURING MAGNETIC ELEMENT, AND SUBSTRATE PROCESSING APPARATUS

摘要

Disclosed is a method for producing a multilayer film, wherein the time for a cleaning process can be reduced. Also disclosed are a method for manufacturing a magnetoresistive effect element, and a substrate processing apparatus. According to an embodiment of the present invention, the inside of an etching apparatus is cleaned with plasma of a mixed gas containing an H2 gas and an O2 gas during an interval between processes. Consequently, the cleaning time is reduced and the productivity is improved.