发明名称 RETICLE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a reticle capable of suppressing formation of a large island-like pattern in scribe lines. <P>SOLUTION: The reticle 8 includes: a square region 112 formed on a substrate and having a product chip pattern formed thereon; a first scribe line 113 formed on the substrate and disposed in contact with the square region 112 and in the periphery of two adjoining sides of the square; second and third scribe lines 1 and 2 formed on the substrate and disposed respectively parallel to two sides of the square except for the above adjoining two sides; and a light-shielding material 14 formed on the substrate and disposed so as to surround the square region 112 and the first, the second and the third scribe lines 113, 1 and 2. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010164729(A) 申请公布日期 2010.07.29
申请号 JP20090006329 申请日期 2009.01.15
申请人 SEIKO EPSON CORP 发明人 USHIYAMA FUMIAKI
分类号 G03F1/68;H01L21/027 主分类号 G03F1/68
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