发明名称 MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD
摘要 A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg2/λ where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measurement light, and m is an integer except for 0.
申请公布号 US2010190115(A1) 申请公布日期 2010.07.29
申请号 US20070280926 申请日期 2007.02.28
申请人 CANON KABUSHIKI KAISHA 发明人 KATO SEIMA;OUCHI CHIDANE
分类号 G03F7/20;G01B11/02;G03B27/54 主分类号 G03F7/20
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