发明名称 STATIC CHEMICAL VAPOR DEPOSITION OF GAMMA-NI + GAMMA
摘要 <p>A static chemical vapor deposition (CVD) process may be used to deposit a coating including a ?-Ni+?1-Ni3A1 phase constitution over a substrate. A static CVD process is performed in a closed system that may include the substrate, and coating material and an activator. The ?</p>
申请公布号 SG162706(A1) 申请公布日期 2010.07.29
申请号 SG20090085192 申请日期 2009.12.21
申请人 ROLLS-ROYCE CORPORATION 发明人 LEE KANG N.;CYBULSKY MICHAEL;BRINDLEY WILLIAM J.
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