发明名称
摘要 <p>The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens (5) arranged to form a detection image of the aerial pattern and an image detector (6) arranged to measure radiation intensities in a plurality, of positions in the detection image.</p>
申请公布号 JP2010526435(A) 申请公布日期 2010.07.29
申请号 JP20100506104 申请日期 2008.04.29
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址