发明名称 |
SPECTROSCOPIC DETECTION METHOD, APPARATUS THEREOF, DEFECT INSPECTION METHOD USING SAME, AND APPARATUS THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To solve the following problem that an optical system of a relatively simple constitution and capable of spectroscopic detection of a wide wavelength range including a short wavelength region, in other words, an ultraviolet region can not have been easily achieved in view of the fact that a wide wavelength range for spectroscopic detection in a short wavelength region is advantageous for detecting the shape of a repetitive pattern uniformly formed in a surface to be inspected through the use of a spectroscopic detection technique. SOLUTION: A pattern defect inspection apparatus is provided with a spectroscopic detection optical system capable of detection in deep-ultraviolet to near-infrared wavelength bands by using a spatially partial mirror 1702 as a half mirror and installing an aperture stop 1710 in a reflection type object lens for restricting the irradiation of an object to be inspected with light and the angle and direction of detection of reflected light from the object to be inspected. COPYRIGHT: (C)2010,JPO&INPIT
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申请公布号 |
JP2010164438(A) |
申请公布日期 |
2010.07.29 |
申请号 |
JP20090007160 |
申请日期 |
2009.01.16 |
申请人 |
HITACHI LTD |
发明人 |
HIROSE TAKESHI;YOSHIDA MINORU;SASAZAWA HIDEAKI;YOSHITAKE YASUHIRO |
分类号 |
G01N21/95;G01B11/30 |
主分类号 |
G01N21/95 |
代理机构 |
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代理人 |
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地址 |
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