发明名称 WET PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a wet processing device and a wet processing method for suppressing galvanic corrosion in a conductive member formed on the surface of a workpiece and removing nano-level particles in a sheet type wet processing feeding processing liquid while rotating the workpiece. SOLUTION: The wet processing device includes a coating means 13 coating at least a part of a surface Wa to be processed of the workpiece W, and feeds the processing liquid in the deoxidized condition by means of a processing liquid supply means 14 while a clearance g is formed between the surface Wa to be processed of the workpiece W held by a holding means 11 and the coating means 13. A voltage is applied between a counter electrode 31a disposed to face the processing surface Wa of the workpiece W, and a processing workpiece electrode 32 connectable to the workpiece W. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010165757(A) 申请公布日期 2010.07.29
申请号 JP20090005168 申请日期 2009.01.13
申请人 MTK:KK 发明人 MATSUI ATSUSHI
分类号 H01L21/306;H01L21/28;H01L21/304;H01L21/3205;H01L23/52 主分类号 H01L21/306
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