| 摘要 |
An apparatus and method for the X-ray irradiation of materials is provided. This apparatus includes an irradiation chamber, a number of flat electromagnetic (X-ray) sources having a number of addressable cathode emitters, a support mechanism, a heat transfer system, a shielding system, and a process controller. A shielded portal within the shielding system allows access to an interior volume of the irradiation chamber. The electromagnetic sources are positioned on or embedded within interior surfaces of the irradiation chamber. These electromagnetic sources generate an electromagnetic flux, such as an X-ray flux, where this flux is used to irradiate the interior volume of the irradiation chamber and any materials placed therein. The operation of the electromagnetic sources and the number of addressable cathode emitters being controlled by the process controller. The materials placed within the interior of the chamber may be supported by a low attenuation support mechanism. This low attenuation support mechanism does not substantially reduce the X-ray flux intended to irradiate the materials placed within the interior volume of the irradiation chamber.
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