发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A method of manufacturing a semiconductor device, includes the steps of: (a) providing a support including a plane having a first region for mounting a chip thereon and a second region provided around the first region; (b) forming an insulating resin layer in a semi-curing state on the plane; (c) forming, on the insulating resin layer, a first opening portion for exposing the first region; (d) fitting a chip in the first opening portion to mount the chip on the first region; and (e) completely curing the insulating resin layer after the step (d).
申请公布号 US2010190295(A1) 申请公布日期 2010.07.29
申请号 US20100691818 申请日期 2010.01.22
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 SHIRAISHI AKINORI
分类号 H01L21/50;H01L21/60 主分类号 H01L21/50
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