| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the uniformity and ignition property of plasma in an ICP source plasma treatment apparatus. <P>SOLUTION: The plasma treatment apparatus includes: a vacuum treatment chamber 1; a dome-shaped vacuum container lid 12 formed of an insulator; a gas supply port 3; a high-frequency induction antenna (antenna) 7 disposed in an upper portion outside the vacuum treatment chamber 1; magnetic coils 81, 82 for forming a magnetic field in the vacuum treatment chamber 1; a yoke 83 for controlling the distribution of the magnetic field; a plasma generating high-frequency power supply 51 for supplying a high-frequency current to the antenna 7; and a power supply for supplying power to the magnetic field coils. The antenna element 7 is divided into n-pieces of high-frequency induction antenna elements 7-1 (not shown), 7-2, 7-3 (not shown), and 7-4, the divided antenna elements are arranged in tandem on a single circumference, high-frequency currents having wavelengths which are successively delayed by each λ/n-wavelength of the high-frequency power supply via delay means 7-2 to 7-4 are made to flow to respective arranged antenna elements which are arranged in tandem so that the high-frequency currents flows while being delayed in order in the clockwise direction, and magnetic fields are applied from the magnetic field coils to generate an ECR phenomenon. <P>COPYRIGHT: (C)2010,JPO&INPIT |
