RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM,申请号WO2009US63394-传众专利搜索

发明名称	RAPID THERMAL PROCESSING CHAMBER WITH MICRO-POSITIONING SYSTEM
摘要	Methods and apparatus for rapid thermal processing of a planar substrate including axially aligning the substrate with a substrate support or with an empirically determined position are described. The methods and apparatus include a sensor system that determines the relative orientations of the substrate and the substrate support.
申请公布号	WO2010054076(A3)	申请公布日期	2010.07.29
申请号	WO2009US63394	申请日期	2009.11.05
申请人	APPLIED MATERIALS, INC.;SORABJI, KHURSHED;RANISH, JOSEPH M.;ADERHOLD, WOLFGANG;HUNTER, AARON M.;KOELMEL, BLAKE R.;LERNER, ALEXANDER N.;MERRY, NIR	发明人	SORABJI, KHURSHED;RANISH, JOSEPH M.;ADERHOLD, WOLFGANG;HUNTER, AARON M.;KOELMEL, BLAKE R.;LERNER, ALEXANDER N.;MERRY, NIR
分类号	H01L21/324;H01L21/68;H01L21/683;H01L21/687	主分类号	H01L21/324
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