APPLICATION OF BENZOCYCLOBUTENE RESIN TO IMPRINTING TECHNIQUE, AND METHOD FOR FORMING PATTERN USING THE TECHNIQUE

摘要

Disclosed is a method for forming a pattern of a benzocyclobutene resin by using a thermal imprint lithography technique. Specifically disclosed is a method for forming a pattern by imprinting, which comprises: a step wherein a layer containing a benzocyclobutene resin that is obtained by polymerizing divinylsiloxane-bisbenzocyclobutene is formed on a substrate; a step wherein a mold is pressed against the layer containing a benzocyclobutene resin while being heated and pressurized, so that a pattern is formed in the layer containing a benzocyclobutene resin; and a step wherein the layer containing a benzocyclobutene resin is released from the mold after being cooled, said layer having been provided with the pattern. In the method for forming a pattern by imprinting, the heating temperature is within the range of 150-350°C.