发明名称 METHOD FOR REVEALING EMERGING DISLOCATION IN CRYSTALLINE GERMANIUM BASED ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of detecting a defect, in more detail, a dislocation emerged in an element having at least one crystalline germanium based surface layer. Ž<P>SOLUTION: This method includes an annealing step, i.e. a step for annealing the element, under an atmosphere having a base of a mixture of at least an oxidizing gas and a neutral gas, capable of oxidizing selectively the dislocation generated in the crystalline germanium based surface layer. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010166046(A) 申请公布日期 2010.07.29
申请号 JP20100001222 申请日期 2010.01.06
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 SANCHEZ LOIC;DEGUET CHRYSTEL
分类号 H01L21/66 主分类号 H01L21/66
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