发明名称 Gated thin-film diode and method of manufacturing the same
摘要 <p>A diode has a first contact (34) of a material having a first conductivity type, a second contact (36) of a material having a second conductivity type arranged co-planarly with the first contact, a channel (38) arranged co-planarly between the first and second contacts, a gate (42) arranged adjacent the channel, and a voltage source electrically connected to the gate. A method includes forming a layer of material on a substrate, forming a first region of a first conductivity in the material, forming a second region of a second conductivity in the material, arranged so as to provide a channel region between the first and second regions, depositing a layer of gate dielectric on the layer of material, arranging a gate adjacent the channel region on the gate dielectric, and electrically connecting a voltage source to the gate.</p>
申请公布号 EP2211375(A2) 申请公布日期 2010.07.28
申请号 EP20100151256 申请日期 2010.01.21
申请人 PALO ALTO RESEARCH CENTER INCORPORATED 发明人 LU, JENG PING;APTE, RAJ B.
分类号 H01L21/329;H01L29/04;H01L29/16;H01L29/20;H01L29/739 主分类号 H01L21/329
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