发明名称 |
Lithographic projection apparatus and gas purging method |
摘要 |
<p>A lithographic projection apparatus (1) includes a support (MT) configured to support a patterning device (MA), the patterning device configured to pattern the projection beam (PB) according to a desired pattern. The apparatus has a substrate table (WT) configured to hold a substrate (W), a projection system (PL) configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system (100) configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator (120) configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer (150) configured to add the moisture to the purge gas and a purge gas mixture outlet (130) connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.</p> |
申请公布号 |
EP2211233(A2) |
申请公布日期 |
2010.07.28 |
申请号 |
EP20100162412 |
申请日期 |
2004.07.21 |
申请人 |
ENTEGRIS, INC. |
发明人 |
PAREKH, BIPIN S;SPIEGELMAN, JEFFREY J;ZELLER, ROBERT S;HOLMES, RUSSELL J |
分类号 |
G03F7/20;G02B27/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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