发明名称 INTERCONNECT STRUCTURES WITH ENCASING CAP AND METHODS OF MAKING THEREOF
摘要 A method of making an interconnect which includes providing an interconnect structure in a dielectric material, recessing the dielectric material such that a portion of the interconnect structure extends above an upper surface of the dielectric and depositing an encasing cap over the extended portion of the interconnect structure.
申请公布号 EP1836726(A4) 申请公布日期 2010.07.28
申请号 EP20050852629 申请日期 2005.12.02
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CLEVENGER, LAWRENCE, A.;DALTON, TIMOTHY, J.;HSU, LOUIS, C.;RADENS, CARL, J.;STANDAERT, THEODORUS, E.;WONG, KEITH, KWONG, HON;YANG, CHIH-CHAO
分类号 H01L21/4763 主分类号 H01L21/4763
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