发明名称 Laser thermal processing with laser diode radiation
摘要 A method and apparatus for performing laser thermal processing (LTP) using a two-dimensional array of laser diodes to form a line image, which is scanned across a substrate. The apparatus includes a two-dimensional array of laser diodes, the radiation from which is collimated in one plane using a cylindrical lens array, and imaged onto the substrate as a line image using an anomorphic, telecentric optical imaging system. The apparatus also includes a scanning substrate stage for supporting a substrate to be LTP processed. The laser diode radiation beam is incident on the substrate at angles at or near the Brewster's angle for the given substrate material and the wavelength of the radiation beam, which is linearly P-polarized. The use of a two-dimensional laser diode array allows for a polarized radiation beam of relatively high energy density to be delivered to the substrate, thereby allowing for LTP processing with good uniformity, reasonably short dwell times, and thus reasonably high throughput.
申请公布号 US7763828(B2) 申请公布日期 2010.07.27
申请号 US20030653625 申请日期 2003.09.02
申请人 ULTRATECH, INC. 发明人 TALWAR SOMIT;MARKLE DAVID A.
分类号 B23K26/00;B23K26/02;B23K26/06;B23K26/073;G03B;H01L21/20 主分类号 B23K26/00
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