发明名称 Wavemeter for gas discharge laser
摘要 An optical configuration to illuminate an etalon in a laser wavemeter with a minimum level of light intensity. The system includes optical components to direct a portion of the laser output beam representing the entire cross section of the beam, through an etalon positioned in an etalon housing and onto a photodetector. A first lens condenses the size of the beam sample, and a second lens re-collimates the beam which then passes into the etalon housing, ensuring that all of the spatial components of the beam are adequately sampled. A diffractive diffusing element is incorporated into the optical path. In a preferred embodiment, the diffractive diffusing element is placed within the etalon housing between said plano-concave lens and the etalon. In another preferred embodiment, the diffusing element is located up stream but outside the housing in the optical path.
申请公布号 USRE41457(E1) 申请公布日期 2010.07.27
申请号 US20050091005 申请日期 2005.03.25
申请人 CYMER, INC. 发明人 NEWMAN PETER C.;MELCHIOR JOHN T.;SANDSTROM RICHARD L.
分类号 H01S3/13;G03F7/20;H01S3/02;H01S3/03;H01S3/036;H01S3/08;H01S3/0971;H01S3/1055;H01S3/139;H01S3/225 主分类号 H01S3/13
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