发明名称 CONTROL SYSTEM, LITHOGRAPHIC APPARATUS AND A METHOD TO CONTROL A POSITION QUANTITY OF A CONTROL LOCATION OF A MOVABLE OBJECT.
摘要 <p>A control system configured to position a control location of a movable object in two or more degrees of freedom with respect to another object, including a set-point generator, a position quantity measurement system, a controller including a single input-single output controller for each degree of freedom to control a position quantity of the control location, each controller providing a control signal in logical coordinates on the basis of the error signal; and a gain scheduling device to provide center-of-gravity control signals in center-of gravity coordinates on the basis of the control signals, wherein the gain scheduling device includes a static and a dynamic relationship between logical coordinates and center-of-gravity coordinates of the movable object.</p>
申请公布号 NL2003993(A) 申请公布日期 2010.07.26
申请号 NL20092003993 申请日期 2009.12.21
申请人 ASML NETHERLANDS B.V. 发明人 HEERTJES MARCEL;HENNEKENS DAAN
分类号 G03F7/20;G03F9/00;H01L21/68 主分类号 G03F7/20
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