| 摘要 |
<p>PURPOSE: A method for manufacturing a photolithography is provided to integrate a ultra-violet exposure process, a stripping process, and a cleaning process into one process using an integration-cleaning solution without a sulphate. CONSTITUTION: An integration-cleaning solution is prepared(S501). The integration-cleaning solution is supplied to a target(S502). The target is rinsed using deionized water(S503). The tart is dried(S504). The integration-cleaning solution comprises 3 to 6 wt% of inorganic alkaline, 1 to 5wt% of phosphate, 1 to 10 wt% of hydrazine hydrate, 1 to 5wt% of chelate dispersing agent, 1 to 3wt% of fluorine surfactant, 80 to 90wt% of deionized water, with respect to total weight of the solution.</p> |
