发明名称 METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE: A method for manufacturing a semiconductor device is provided to eliminate residue from processing units by performing purifying operations with respect to each processing unit during a substrate is transferring between the processing units. CONSTITUTION: A semiconductor substrate is loaded into a processing chamber including a plurality of processing units(S100). A substrate is being transferred along the processing units, and separate operations are performed in each processing unit(S200). While the substrate is transferred between the processing units, a purifying operation is performed with respect to each processing unit(S300). By-products and residue from the processing units are eliminated.</p>
申请公布号 KR20100084207(A) 申请公布日期 2010.07.26
申请号 KR20090003558 申请日期 2009.01.16
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, JIN HO;CHOI, GIL HEYUN;PARK, BYUNG LYUL;LEE, JONG MYEONG;CHOI ZUNG SUN;JUNG, HYE KYUNG
分类号 H01L21/306;H01L21/677 主分类号 H01L21/306
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