发明名称 RETAINER RING FOR CMP MACHINE
摘要 PURPOSE: A retainer ring for a chemical mechanical polishing machine is provided to prevent the contamination of a combining part which is located between a head and a retainer ring by combining a cover on the outside of the retainer ring. CONSTITUTION: Both ends of a cover(110) are respectively connected with a retainer ring(100) and a head(120) in order to combine the head and the combining part of the retainer ring. The cover is ring shaped and includes a first combining hole(112), a second combing hole(114), and a connector(116). A first combining groove and a second combining groove are formed on the retainer ring and the head.
申请公布号 KR100972173(B1) 申请公布日期 2010.07.23
申请号 KR20090063634 申请日期 2009.07.13
申请人 SAM CHEON CO., LTD. 发明人 CHO, SANG MAN
分类号 H01L21/304 主分类号 H01L21/304
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