摘要 |
PURPOSE: A retainer ring for a chemical mechanical polishing machine is provided to prevent the contamination of a combining part which is located between a head and a retainer ring by combining a cover on the outside of the retainer ring. CONSTITUTION: Both ends of a cover(110) are respectively connected with a retainer ring(100) and a head(120) in order to combine the head and the combining part of the retainer ring. The cover is ring shaped and includes a first combining hole(112), a second combing hole(114), and a connector(116). A first combining groove and a second combining groove are formed on the retainer ring and the head.
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