METHOD FOR PRODUCING RESIN SOLUTION FOR PHOTORESIST, PHOTORESIST COMPOSITION, AND PATTERN-FORMING METHOD

摘要

Disclosed is a method for producing a resin solution for photoresists, which is characterized in that a solution containing a photoresist resin which is made alkali-soluble by an acid is heated and aged at 30-90°C for 30 minutes or longer and then filtered by a filtering member having a pore size of not more than 1 µm. Also disclosed is a photoresist composition having good filterability, which enables formation of a uniform pattern. Further disclosed is a resin solution for photoresists which is stable for a long time, namely a resin solution for photoresists which is not deteriorated in filterability even after long-time storage.