| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a gas contamination sensor capable of monitoring the level of contaminant substance in a lithographic device. <P>SOLUTION: The gas contamination sensor includes an ion source which produces ion beam from the sample of gas to be tested, a first and a second ion detectors while respective first and second ion detectors receive ion from ion beams deflected in different ranges. The first ion detector receives ion produced from primary gas in the gas to be tested while the second ion detector receives the ion produced from the contaminant substance gas in the sample to be tested. <P>COPYRIGHT: (C)2010,JPO&INPIT |
