| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing system capable of performing patterning multiple times on one layer with high efficiency. <P>SOLUTION: The substrate processing system includes: a carrier block S1; a processing block S2 having a first coating processing unit 31 which performs first coating processing on substrates carried in, one after another, from the carrier block S1, a first development processing unit 41 which performs first development processing, a second coating processing unit 32 which performs second coating processing, and a second development processing unit 42 which performs second development processing; an interface block S3 which passes and receives the substrates to and from an exposure device; and a substrate conveying mechanism configured to convey the substrates among them. The substrate processing system is adaptive to the exposure device which exposes one substrate at least twice, wherein the first coating processing unit 31, first development processing unit 41, second coating processing unit 32, and second development processing unit 42 are arranged such that coating processing steps and development processing steps can be performed in order in a manner of a single stroke of the pen. <P>COPYRIGHT: (C)2010,JPO&INPIT |
