发明名称 SUPPORT STRUCTURE OF CATALYST BODY IN CATALYTIC CHEMICAL VAPOR-DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a support structure of catalyst body in a catalytic chemical vapor-deposition apparatus achieving the long-term repetitive use of the catalyst body by preventing film adhesion on a holding member for holding the catalyst body. SOLUTION: A adhesion-preventive unit 1 is divided into an upper member 1a and a lower member 1b in the direction substantially orthogonal to the axis of a catalyst body 4 with a part in a vicinity of the axis of the catalyst body 4 being a border. Consequently, a holding member 20 and the adhesion-preventive unit 1 are detachably suitable for a column support 130 of a catalytic chemical vapor-deposition apparatus in a non-contact manner with the catalyst body 4. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010159450(A) 申请公布日期 2010.07.22
申请号 JP20090001520 申请日期 2009.01.07
申请人 ISHIKAWA SEISAKUSHO LTD 发明人 NIKI TOSHIICHI
分类号 C23C16/44;H01L21/3065;H01L21/31 主分类号 C23C16/44
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