发明名称 METHOD OF FORMING AN ISOLATION STRUCTURE
摘要 Provided is a method of fabricating a semiconductor device that includes providing a semiconductor substrate having a front side and a back side, forming a first circuit and a second circuit at the front side of the semiconductor substrate, bonding the front side of the semiconductor substrate to a carrier substrate, thinning the semiconductor substrate from the back side, and forming an trench from the back side to the front side of the semiconductor substrate to isolate the first circuit from the second circuit.
申请公布号 US2010181638(A1) 申请公布日期 2010.07.22
申请号 US20090357094 申请日期 2009.01.21
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WANG CHING-CHUN;HSU TZU-HSUAN
分类号 H01L25/16;H01L21/762 主分类号 H01L25/16
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