| 摘要 |
The Lithography apparatus of the present invention includes a container conveyance unit configured to convey a sealed container accommodating a substrate from the exterior of the apparatus to the interior of the apparatus, an opener provided in the interior of the lithography apparatus for opening and closing a front door of the sealed container, and a substrate conveyance unit configured to convey the substrate accommodated in the sealed container to a processing section. The container conveyance unit is extendable and retractable so as to be accommodated in the interior of the apparatus when the sealed container is conveyed from the exterior of the apparatus to the interior of the apparatus.
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