PROXIMITY EXPOSURE APPARATUS, SUBSTRATE POSITIONING METHOD FOR PROXIMITY EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

摘要

PROBLEM TO BE SOLVED: To position a large substrate while rotating it with high accuracy.

SOLUTION: A θ stage 8 that rotates a chuck 10 is composed of: a bearing 42 in which an inner ring 42a and an outer ring 42b relatively rotate by rotation of a plurality of rollers 42c placed between the inner ring 42a and the outer ring 42b; and a guide 43 in which a moving block 43b moves a rail 43a disposed like a ring outside the bearing 42. A substrate 1 is positioned by rotating the chuck 10 by the θ stage 8. The bearing 42 acts to maintain the rotation accuracy of the θ stage 8, while the guide 43 acts to support most of the load in the vertical direction by the weight of the chuck 10 and the substrate 1. Thus, the large substrate 1 is rotated and positioned with high accuracy, which improves exposure accuracy.

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