发明名称 |
Epitaxial Structure Having Low Defect Density |
摘要 |
An epitaxial structure having a low defect density includes: a base layer; a first epitaxial layer having a plurality of concentrated defect groups, and an epitaxial surface that has a plurality of first recesses corresponding in position to the concentrated defect groups, the sizes of the first recesses being close to each other; and a plurality of defect-termination blocks respectively and filling the first recesses and having polished surfaces. The defect-termination blocks are made of a material which is different in removal rate from that of the first epitaxial layer. The polished surfaces are substantially flush with the epitaxial surface so that the first epitaxial layer has a substantially planarized crystal growth surface
|
申请公布号 |
US2010181576(A1) |
申请公布日期 |
2010.07.22 |
申请号 |
US20100688005 |
申请日期 |
2010.01.15 |
申请人 |
WUU DONG-SING;HORNG RAY-HUA;CHEN SHIH-TING;TSAI TSHUNG-HAN;WU HSUEH-WEI |
发明人 |
WUU DONG-SING;HORNG RAY-HUA;CHEN SHIH-TING;TSAI TSHUNG-HAN;WU HSUEH-WEI |
分类号 |
H01L29/20 |
主分类号 |
H01L29/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|