发明名称 |
ENHANCED LOW ENERGY ION BEAM TRANSPORT IN ION IMPLANTATION |
摘要 |
An ion implantation method and system that incorporate beam neutralization to mitigate beam blowup, which can be particularly problematic in low-energy, high-current ion beams. The beam neutralization component can be located in the system where blowup is likely to occur. The neutralization component includes a varying energizing field generating component that generates plasma that neutralizes the ion beam and thereby mitigates beam blowup. The energizing field is generated with varying frequency and/or field strength in order to maintain the neutralizing plasma while mitigating the creation of plasma sheaths that reduce the effects of the neutralizing plasma.
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申请公布号 |
US2010181499(A1) |
申请公布日期 |
2010.07.22 |
申请号 |
US20090357973 |
申请日期 |
2009.01.22 |
申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
VANDERBERG BO H.;DIVERGILIO WILLIAM F. |
分类号 |
A61N5/00;H01J27/00;H01J49/00 |
主分类号 |
A61N5/00 |
代理机构 |
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地址 |
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