发明名称 |
HIGHER-ORDER SILANE COMPOSITION, METHOD FOR MANUFACTURING SUBSTRATE WITH FILM, ELECTRO-OPTICAL EQUIPMENT AND ELECTRONIC DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a higher-order silane composition capable of forming a safe, high-quality film with desired thickness through a liquid phase process. SOLUTION: The higher-order silane composition is a composition containing a higher-order silane compound and a solvent, provided that the solvent comprises a cyclic hydrocarbon which has one or two double bonds, does not have any alkyl group, comprises only carbons and hydrogens and has a refractive index of 1.40-1.51, a dielectric constant of≤3.0 and a molecular weight of≤180. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010159191(A) |
申请公布日期 |
2010.07.22 |
申请号 |
JP20090003554 |
申请日期 |
2009.01.09 |
申请人 |
JAPAN SCIENCE & TECHNOLOGY AGENCY;SEIKO EPSON CORP;JSR CORP |
发明人 |
SHIMODA TATSUYA;MATSUKI YASUO;MASUDA TAKASHI |
分类号 |
C01B33/04;C01B33/02;C01B33/12;H01L21/208;H01L21/316 |
主分类号 |
C01B33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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