发明名称 CAPACITOR AND PROCESS FOR MANUFACTURING CAPACITOR
摘要 <p>Disclosed is a capacitor characterized by comprising: a lower electrode layer comprising an electrically conductive metal or a compound of the metal; a first dielectric film formed on the lower electrode layer and comprising ZrO2; a second dielectric film formed on the first dielectric film and comprising a dielectric material comprising a Ti-containing metal oxide; and an upper electrode layer formed on the second dielectric film.</p>
申请公布号 WO2010082605(A1) 申请公布日期 2010.07.22
申请号 WO2010JP50350 申请日期 2010.01.14
申请人 TOKYO ELECTRON LIMITED;ARIKADO, TSUNETOSHI;KAITSUKA, TAKANOBU;AKASAKA, YASUSHI;ALBERT, CHIN 发明人 ARIKADO, TSUNETOSHI;KAITSUKA, TAKANOBU;AKASAKA, YASUSHI;ALBERT, CHIN
分类号 H01L21/8242;H01L21/8246;H01L27/105;H01L27/108 主分类号 H01L21/8242
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