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发明名称
Verfahren zur Herstellung eines Kobaltsilizidfilms und zur Herstellung einer einen Kobaltsilizidfilm enthaltenden Halbleitervorrichtung
摘要
申请公布号
DE60332905(D1)
申请公布日期
2010.07.22
申请号
DE20036032905
申请日期
2003.10.16
申请人
SAMSUNG ELECTRONICS CO. LTD.
发明人
KOO, KYEONG-MO;KU, JA-HUM;PARK, HYE-JEONG
分类号
C23C16/42;H01L21/24;C23C14/02;C23C14/16;C23C14/58;H01L21/28;H01L21/336;H01L29/78
主分类号
C23C16/42
代理机构
代理人
主权项
地址
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