发明名称 Low Leakage High Performance Static Random Access Memory Cell Using Dual-Technology Transistors
摘要 A memory cell includes a storage element, a write circuit coupled to the storage element and a read circuit coupled to the storage element. At least a portion of the storage element and at least a portion of the write circuit are fabricated using a thicker functional gate oxide and at least a portion of the read circuit is fabricated using a thinner functional gate oxide.
申请公布号 US2010182823(A1) 申请公布日期 2010.07.22
申请号 US20090357938 申请日期 2009.01.22
申请人 QUALCOMM INCORPORATED 发明人 GARG MANISH;CHAI CHIAMING;PHAN MICHAEL THAITHANH
分类号 G11C11/00;G11C11/416 主分类号 G11C11/00
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