| 摘要 |
A plasma inside vapor deposition apparatus for making silicon thin film solar cell modules including means for supporting a substrate, the substrate having an outer surface and an inner surface; plasma torch means located proximal to the inner surface for depositing at least one thin film layer on the inner surface of the substrate, the plasma torch means located a distance from the substrate; and means for supplying reagent chemicals to the plasma torch means, wherein the at least one thin film layer form the silicon thin film solar cell modules.
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