| 摘要 |
The present invention relates to a method for fabricating a metal nano-plate using metal, halide metal, or a mixture thereof, as a precursor. More particularly, the method of the present invention involves performing heat treatment on the precursor and a single-crystalline substrate under the atmosphere of inert gas, thereby forming a single-crystalline metal nano-plate on the single crystalline substrate, wherein the precursor contains metal, halide metal, or a mixture thereof, and is disposed in the front end of a reaction furnace, and the single-crystalline substrate is disposed in the rear end of the reaction furnace. The method of the present invention uses a vapor-phase transport process, which employs no catalyst, to fabricate a micro-sized metal nano-plate. The method of the present invention simplifies processes, improves reproducibility, and produces a high-purity single-crystalline noble metal nano-plate having high crystalline properties and containing no defects and no impurities. The method of the present invention can controle the direction of the surface of the single crystalline substrate, thereby controlling the shape of the metal nano-plate and the orientation relative to the single crystalline substrate. Also, the method of the present invention enables the mass production of micro-sized metal nano-plates. |
