| 发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME |
| 摘要 |
<p>A second interlayer insulating film (108) containing a pore-forming material (107) is formed on a semiconductor substrate (101). Next, the second interlayer insulating film (108) is irradiated with ultraviolet light (UV). In this ultraviolet light irradiation step, irradiation of ultraviolet light is carried out at least twice.</p> |
| 申请公布号 |
WO2010082250(A1) |
申请公布日期 |
2010.07.22 |
| 申请号 |
WO2009JP05668 |
申请日期 |
2009.10.27 |
| 申请人 |
PANASONIC CORPORATION;SEO, KOUHEI |
发明人 |
SEO, KOUHEI |
| 分类号 |
H01L21/768;H01L21/316;H01L23/522 |
主分类号 |
H01L21/768 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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