NOZZLE SUBSTRATE FORMED OF SILICON, LIQUID DROPLET DISCHARGE HEAD EQUIPPED WITH THE NOZZLE SUBSTRATE FORMED OF SILICON, LIQUID DROPLET DISCHARGE APPARATUS CARRYING THE LIQUID DROPLET DISCHARGE HEAD, AND MANUFACTURING METHOD FOR THE NOZZLE SUBSTRATE FORMED OF SILICON

摘要

<P>PROBLEM TO BE SOLVED: To provide a nozzle substrate formed of silicon etc. which can improve an alkali resistance by managing the composition of a discharge liquid-resisting protective film. Ž<P>SOLUTION: The nozzle substrate formed of silicon 1 has a nozzle hole 11, with the discharge liquid-resisting protective film 13 formed on a surface. An infrared reflecting film 15 is prepared at a part between the surface 100a of a silicon base material 100 on the liquid droplet discharge side and the discharge liquid-resisting protective film 13. In this case, the discharge liquid-resisting protective film 13 is formed continuously from the surface 100a on the liquid droplet discharge side of the silicon base material 100 to the inner wall 11c of the nozzle hole 11. The infrared reflecting film 15 is formed in a region not subject to nozzle cleaning, having aluminum or titanium oxide as the main component. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž