发明名称 |
METHOD OF FORMING A MICROELECTRONIC STRUCTURE |
摘要 |
<p>Novel, developer-soluble anti-reflective coating compositions and methods of using those compositions are provided. The compositions comprise a multi-functional acid reacted with a multi-functional vinyl ether to form a branched polymer or oligomer. In use, the compositions are applied to a substrate and thermally crosslinked. Upon exposure to light and post-exposure baking, the cured polymers/oligomers will decrosslink and depolymerize, rendering the layer soluble in typical photoresist developing solutions (e.g., alkaline developers).</p> |
申请公布号 |
EP2207837(A2) |
申请公布日期 |
2010.07.21 |
申请号 |
EP20080843358 |
申请日期 |
2008.10.30 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
XU, HAO;MERCADO, RAMIL-MARCELO, L.;GUERRERO, DOUGLAS, J.;MEADOR, JIM, D. |
分类号 |
C08G65/30;C08G65/48;C08J3/28;G03F7/038;G03F7/16 |
主分类号 |
C08G65/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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