SUBTRATE SUPPORTING MEMBER AND APPRATUS FOR TREATMENTING SUBSTRATE INCLUDING THE SAME

摘要

PURPOSE: A substrate supporting unit and a substrate processing device are provided to prevent a susceptor from being separated from a rotation path by installing a matching unit including an insertion unit on the lower side of the susceptor. CONSTITUTION: A disc(130) comprises a plurality of insertion areas. A heater(120) is positioned on the lower side of the disc. A plurality of susceptors is installed in a plurality of insertion areas. An exhausting unit(126) exhausts the process gas inside a chamber(114). A gas supply device supplies driving gas to apply a driving force to a driving force transmitting unit. A substrate settling unit(118) aligns the susceptor in the insertion area.