发明名称 |
Rupture resistant plasma tube |
摘要 |
A system for producing plasma tubes that can withstand a wide variety of physical and environmental stressors within a plasma processing system is disclosed. Within such a plasma processing system, a plasma tube structure has a central body portion—having a fixed outer diameter. At a first end of the plasma tube structure, an outwardly extending flange may be provided. At a second end of the plasma tube, an edge portion is provided—having an outer diameter that is less than the fixed outer diameter of the central body portion. The edge portion is formed to facilitate easy and secure engagement of the plasma tube structure with a compression mechanism. The plasma tube structure is formed of material that provides sufficient structural integrity and degradation resistance.
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申请公布号 |
US7759600(B2) |
申请公布日期 |
2010.07.20 |
申请号 |
US20060375992 |
申请日期 |
2006.03.15 |
申请人 |
SAMSUNG AUSTIN SEMICONDUCTOR, L.P.;SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HEEMSTRA DAVID;WHITE KEVIN |
分类号 |
B23K10/00 |
主分类号 |
B23K10/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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