发明名称 Electron lens and charged particle beam apparatus
摘要 The present invention provides a compact electron lens causing little aberration, and a charged particle beam apparatus such as a scanning electron microscope that is super compact and offers a high resolution. An upper magnetic pole and a sample-side magnetic pole are magnetically coupled to the respective poles of a permanent magnet that is made of a highly strong magnetic material such as a rare-earth cobalt system or a neodymium-iron-boron system, that is axially symmetrical, and that has a hole in the center thereof. An inner gap is created on the side of a center axis. Thus, a magnetic lens is formed axially. Moreover, a semi-stationary magnetic path that shields an outside magnetic field and has the magnetic reluctance thereof regulated is disposed outside. The sample-side magnetic pole and magnetic path defines a region where magnetic reluctance is the highest outside the permanent magnet. A space defined by the permanent magnet, upper magnetic pole, sample-die magnetic pole, and semi-stationary magnetic path is filled with a filling made of a non-magnetic material. Thus, an objective lens is constructed.
申请公布号 US7759652(B2) 申请公布日期 2010.07.20
申请号 US20070749181 申请日期 2007.05.16
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 OHSHIMA TAKASHI;SATO MITSUGU;KANEKO YUTAKA;KATAGIRI SOUICHI;TAKEUCHI KOICHIRO
分类号 H01J1/50 主分类号 H01J1/50
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