发明名称 |
Monitoring a photolithographic process using a scatterometry target |
摘要 |
A method is provided for monitoring a photolithographic process in which a substrate is patterned to form (i) a scatterometry target having a plurality of parallel elongated features, and desirably, (ii) other features each having at least one of a microelectronic function or a micro-electromechanical function. Desirably, each elongated feature of the scatterometry target has a length in a lengthwise direction and a plurality of stress-relief features disposed at a plurality of positions along the length of each elongated feature. A return signal is detected in response to illumination of the scatterometry target. The return signal can be used to determine a result of the photolithographic process.
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申请公布号 |
US7760360(B2) |
申请公布日期 |
2010.07.20 |
申请号 |
US20070820305 |
申请日期 |
2007.06.18 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ARCHIE CHARLES N.;SENDELBACH MATTHEW J. |
分类号 |
G01N21/55;G01B11/14;G03B27/32;G03C5/00;G03F7/20;G03F9/00;H01L23/544 |
主分类号 |
G01N21/55 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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