发明名称 PHOTOPOLYMER COMPOSITION
摘要 FIELD: chemistry. ^ SUBSTANCE: invention relates to preparation of reactive photopolymer compositions based on polysulfone solutions used for making coatings for various purposes. The disclosed photopolymer composition contains the following (pts. wt): polysulfone based on 2,2-bis(4-oxyphenyl)propane and 4,4'-dichlorodiphenylsulfone with molecular weight of 40000-56000 (35-50), styrene as a solvent (65-50), polyethylene glycol dimethacrylate or diacrylate with molecular weight of the polyethylene glycol link of 400-600 as a polymerisable compound (20-50) and 2,4,6-trimethylbenzoyldiphenylphosphine oxide as a photoinitiator (2-6). ^ EFFECT: preparation of a composition which enables faster preparation of a coating with fewer process steps, increased elasticity of photopolymer materials based on polysulfone, as well as minimisation of the amount of volatile solvent during formation of the coating. ^ 1 cl, 2 tbl, 12 ex
申请公布号 RU2394856(C1) 申请公布日期 2010.07.20
申请号 RU20080151475 申请日期 2008.12.24
申请人 GOSUDARSTVENNOE OBRAZOVATEL'NOE UCHREZHDENIE VYSSHEGO PROFESSIONAL'NOGO OBRAZOVANIJA VOLGOGRADSKIJ GOSUDARSTVENNYJ TEKHNICHESKIJ UNIVERSITET (VOLGGTU) 发明人 VANIEV MARAT ABDURAKHMANOVICH;SIDORENKO NINA VLADIMIROVNA;LUKASIK VLADISLAV ANTONOVICH;BELJAVTSEVA LJUDMILA NIKOLAEVNA;DURMISH-OGLY LARISA IGOREVNA;NOVAKOV IVAN ALEKSANDROVICH
分类号 C08F2/48;C08G75/20;C08L55/00 主分类号 C08F2/48
代理机构 代理人
主权项
地址
您可能感兴趣的专利