| 发明名称 |
Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same |
| 摘要 |
A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer is useful in a damascene process and an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.
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| 申请公布号 |
US7759052(B2) |
申请公布日期 |
2010.07.20 |
| 申请号 |
US20080135644 |
申请日期 |
2008.06.09 |
| 申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
JUNG JAE CHANG;LEE SUNG KOO |
| 分类号 |
G03F7/11;C08F8/34;C08F28/00;C08K5/42;C08L25/18;C08L33/06;G03F7/26;H01L21/027;H01L21/3205;H01L21/768 |
主分类号 |
G03F7/11 |
| 代理机构 |
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代理人 |
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