发明名称 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film
摘要 The present invention relates to an Ag alloy film. Particularly, it is preferably used as a reflective film or semi-transmissive reflective film for an optical information recording medium having high thermal conductivity/high reflectance/high durability in the field of optical information recording media, an electromagnetic-shielding film excellent in Ag aggregation resistance, and an optical reflective film on the back of a reflection type liquid crystal display device, or the like. The Ag alloy film of the present invention comprises an Ag base alloy containing Bi and/or Sb in a total amount of 0.005 to 10% (in terms of at %). Further, the present invention relates to a sputtering target used for the deposition of such an Ag alloy film.
申请公布号 US7758942(B2) 申请公布日期 2010.07.20
申请号 US20080100823 申请日期 2008.04.10
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO 发明人 TAUCHI YUUKI;TAKAGI KATSUTOSHI;NAKAI JUNICHI;SATO TOSHIKI
分类号 B32B3/02;B32B15/04;C22C5/06;C22C5/08;C23C14/14;C23C14/18;C23C14/34;G11B7/24;G11B7/253;G11B7/2531;G11B7/257;G11B7/258;G11B7/259;G11B7/26 主分类号 B32B3/02
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