发明名称 |
Dual top gas feed through distributor for high density plasma chamber |
摘要 |
A gas distributor for use in a semiconductor process chamber comprises a body. The body includes a first channel formed within the body and adapted to pass a first fluid from a first fluid supply line through the first channel to a first opening. A second channel is formed within the body and adapted to pass a second fluid from a second fluid supply line through the second channel to a second opening. The first and second openings are arranged to mix the fluids outside the body after the fluids pass through the openings.
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申请公布号 |
US7758698(B2) |
申请公布日期 |
2010.07.20 |
申请号 |
US20060564122 |
申请日期 |
2006.11.28 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BANG WON B.;NEMANI SRIVIVAS D.;PHAM PHONG;YIEH ELLIE Y. |
分类号 |
C23C16/455;C23C16/06;C23C16/22;C23F1/00;H01L21/306 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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