发明名称 ALIGNMENT APPARATUS FOR SEMICONDUCTOR WAFER
摘要 PURPOSE: An apparatus for aligning a semiconductor wafer is provided to correct the center of the wafer with a reference position based on the alignment mark including the peripheral position, the notch, and the orientation plat of the wafer. CONSTITUTION: The size of a supporting stage(1) is larger than that of the outer shape of a wafer(W). An optical sensor(2) optically detects the peripheral position of the wafer on the supporting stage. A charge-coupled device camera(3) detects the phase position of a notch which determines the location of the wafer. A driving unit(M) rotates the supporting stage. Based on the detection result of the optical sensor, the alignment of the wafer is implemented.
申请公布号 KR20100082312(A) 申请公布日期 2010.07.16
申请号 KR20100001130 申请日期 2010.01.07
申请人 NITTO DENKO CORPORATION 发明人 YAMAMOTO MASAYUKI;NONOMURA KENJI;IKEDA SATOSHI
分类号 H01L21/68 主分类号 H01L21/68
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