发明名称 POLYPROPYLENE-BASED RESIN COMPOSITION AND FILM COMPRISING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a polypropylene-based resin composition excellent in blocking resistance and excellent in impact resistance at low temperature. Ž<P>SOLUTION: The polypropylene-based resin composition contains a polypropylene-based copolymer containing 50-95 wt.% of a polymer component (component A) in which a structural unit derived from propylene is a main component, and 5-50 wt.% of a polymer component (component B) of propylene, ethylene and 4C or more α-olefin in which a content (X) of a structural unit derived from propylene is 10≤X<50 wt.%, a content (Y) of a structural unit derived from ethylene is 50<Y≤70 wt.%, and a content (Z) of a structural unit derived from the 4C or more α-olefin is 0<Z≤20 wt.%, and 1-25 pts.wt. of an ethylene-based polymer having a density of 0.940 g/cm<SP>3</SP>or more. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010155964(A) 申请公布日期 2010.07.15
申请号 JP20090148564 申请日期 2009.06.23
申请人 SUMITOMO CHEMICAL CO LTD 发明人 IKEDA KENJI;KIDAI SHIGEKI
分类号 C08L23/12;C08L23/06;C08L23/16 主分类号 C08L23/12
代理机构 代理人
主权项
地址